Improved emission intensity of rare gas flow excimer lamps

Institute of Physics Conference Series

Volumn 182, Issue , 2004, Pages 175-176

  Matsuzawa, S ^a   Sumitomo, T ^a   Yoshioka, M ^a   Hishinuma, N ^a   Matsuno, H ^a   Hiramoto, T ^a  

^a USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ELECTRIC IMPEDANCE; ELECTRIC POTENTIAL; ELECTRODES; LIGHT EMISSION; LIGHT SOURCES; LIQUID CRYSTAL DISPLAYS; THERMOCOUPLES; ULTRAVIOLET RADIATION;

DIELECTRIC BARRIER DISCHARGE (DBD); EXCIMER LAMPS; MASS FLOW CONTROLLER; PLASMA IMPEDANCE;

ELECTRIC LAMPS;

EID: 5044221698     PISSN: 09513248     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. U. Kogelsehatz, Plasma Chemistry and Plasma Processing, 23(1), (2003).1
2. I. W. Boyd, J. -Y. Zhang and U. Kogelschatz, "Development and Applications of UV Excimer Lamps", A. Peled, Ed., Kluwer Academic Publishers, (2003), 161