p-Type conduction in Al-N co-doped ZnO films

Materials Letters

Volumn 58, Issue 29, 2004, Pages 3741-3744

  Yuan, Guodong ^a   Ye, Zhizhen ^a   Zhu, Liping ^a   Zeng, Yujia ^a   Huang, Jingyun ^a   Qian, Qing ^a   Lu, Jianguo ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Al and N co doping method; Epitaxial growth; Magnetron sputtering; p Type conduction; Semiconductors; Zinc oxide thin films

Indexed keywords

ALUMINUM NITRIDE; AMMONIA; ENERGY GAP; EPITAXIAL GROWTH; HALL EFFECT; MAGNETRON SPUTTERING; METALLIC FILMS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AL AND N CO-DOPING METHOD; P-TYPE CONDUCTION; ZINC OXIDE THIN FILMS;

ZINC OXIDE;

EID: 5044220146     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.02.056     Document Type: Article

References (18)

1. Z.K. Tang, G.K.L. Wong, P. Yu, et al., Appl. Phys. Lett. 72 (1998) 3270.
2. D.M. Bagnell, Y.F. Chen, Z. Zhu, et al., Appl. Phys. Lett. 70 (1997) 2230.
3. K. Minegishi, Y.-Koiwai, Y. Kikuchi, et al., Jpn. J. Appl. Phys. 36, (1997) L 1453.
4. X.L. Quo, H. Tabara, T. kawai, J. Cryst. Growth 233 (2001) 135.
5. Y.R. Ryu, S. Zhu, D.C. Look, et al., J. Cryst. Growth 210 (2000) 330.
6. T. Yamamoto, H. Yoshida, Jpn. J. Appl. Phys., Part 2 38 (1999) L166.
7. M. Joseph, H. Tabata, et al., Jpn. J. Appl. Phys. 38 (1999) L1205-L1207.
8. M. Komatsu, N. Ohashi, I.S. guchi, Appl. Surf. Sci. 189 (2002) 349-352.
9. K. Nakahara, H. Takasu, Appl. Phys. Lett. 79 (2001) 25.
10. A. Tsukazaki, H. Saito, K. Tamura, et al., Appl. Phys. Lett. 81 (2002) 2.
11. A. Tiwari, C. Jin, A. Kvit, D. Kumar, J.F. Muth, J. Narayan, Solid State Commun. 121 (2002) 371-374.
12. De-Wei Ma, Zhi-Zhen Ye, Jing-Yun Huang, et al., Chin. Phys. Lett. 20 (6) (2003) 942.
13. Dongjiang Qiu, Huizhen Wu, Ailing Yang, Xiaoling Xu, Chin. J. Mater. Res. 14 (5) (2000) 485 (in Chinese).
14. K. Minegishi, Y. Koiwai, Y. Kikuchi, et al., Jpn. J. Appl. Phys. 36 (1997) L1453.
15. A. Kamata, H. Mitsuhashi, et al., Appt. Phys. Lett. 63 (24) (1993) 3353-3354.
16. M. Joseph, H. Tabata, et al., Physica. B 140-148 (2001) 302-303.
17. Zhi-Zhen Ye, Jian-Guo Lu, et al., J. Cryst. Growth 253 (2003) 258.
18. D.M. Carballeda-Galicia, R. Castanedo-Perez, Thin Solid Films 371 (2000) 105-108.