Optical spectroscopy to control a plasma reactor for surface treatments

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5220-5224

  Ricard, A ^a   Gaboriau, F ^a   Canal, C ^a  

^a Laboratoire Plasma et Conversion d'Energie   (France)

Author keywords

Membranes transmission; Plasma spectroscopy; Post discharges; TALIF

Indexed keywords

ATOMIC SPECTROSCOPY; EMISSION SPECTROSCOPY; LASER OPTICS; MOLECULAR SPECTROSCOPY; MULTIPHOTON PROCESSES; PLASMA APPLICATIONS; PLASMAS;

IN SITU DIAGNOSTICS; LASER INDUCED FLUORESCENCE LIF); MEMBRANES TRANSMISSION; OPTICAL SPECTROSCOPIES; PLASMA REACTORS; PLASMA SPECTROSCOPY; POST-DISCHARGES; SURFACE TREATMENTS; TALIF; TWO PHOTONS;

SURFACE TREATMENT;

EID: 50349087915     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.070     Document Type: Article

References (12)

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