Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5680-5683

  Frach, P ^a   Bartzsch, H ^a   Gloss D ^a   Fahland, M ^a   Handel F ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

CIS CIGS photovoltaics; Electrically insulating films; HAD process; PECVD; Pressure sensor; Reactive pulse magnetron sputtering

Indexed keywords

TECHNOLOGY;

CIS/CIGS PHOTOVOLTAICS; ELECTRICALLY INSULATING; ELECTRICALLY INSULATING FILMS; HAD-PROCESS; MEDICAL TECHNOLOGIES; PECVD; PHOTOVOLTAICS; PRESSURE SENSOR; REACTIVE PULSE MAGNETRON SPUTTERING;

ALUMINUM;

EID: 50349083199     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.043     Document Type: Article

References (5)

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4. Morgner H., Händel F., and Metzner Chr. Proc. 50th Ann. Techn. Conf. SVC, Louisville (2007) 252
5. Bartzsch H., Frach P., and Goedicke K. Surf. Coat. Technol. 132 (2000) 244