Nanomaterial fabrication by Ru atomic layer deposition on anodic aluminum oxide nanotemplate

2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

Volumn 1, Issue , 2006, Pages 636-637

  Kim, Woo Hee ^b   Park, Sang Joon ^b   Kim, H ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b NONE

Author keywords

AAO; Atomic layer deposition; Ruthenium

Indexed keywords

ALUMINA; ALUMINUM; ATOMIC PHYSICS; ATOMS; LIGHT METALS; METALLIC COMPOUNDS; NANOTECHNOLOGY; OPTICAL DESIGN; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; RUTHENIUM; TECHNOLOGY; THICK FILMS;

AAO; ANODIC ALUMINUM OXIDE; ATOMIC LAYER DEPOSITIONS; LOW RESISTIVITY; METALLIC NANOSTRUCTURE; NANO MATERIALS; NANOTEMPLATE; ONE-DIMENSIONAL; THIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 50249159063     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NMDC.2006.4388940     Document Type: Conference Paper

References (6)

1. M. L. Green, M. E. Gross, L. E. Papa, K. J. Schnoes, and D. Brasen, "Chemical vapor deposition of ruthenium and ruthenium dioxide films," J. Electrochem. Soc., vol. 132, pp. 2677-2684, 1985.
2. O.-K. Kwon, J.-H. Kim, H.-S. Park, and S.-W. Kang, "Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layuer," J. Electrochem. Soc., vol. 151, pp. G109-G112, 2004
3. O.-K. Kwon, S.-H. Kwon, H.-S. Park, and S.-W. Kang, "PEALD of a Ruthenium Adhesion Layer for Copper Interconnects," J. Electrochem, Soc, vol. 151, pp. C753-C756, 2004
4. T. Aaltonen, A. Rahtu, M. Ritala, and M. Leskela, "Reaction Mechanism Studies on Atomic Layer Depostion of Ruthenium and Platinum," Electrochme. Lett., vol. 6, pp. C130-C133, 2003.
5. T. Aaltonen, P. Alen, M. Ritala, and M. Leskela, "Ruthenium Thin Films Grown by Atomic Layer Depoistion," Chem. Vap. Depostion, vol. 9, pp. 45-49, 2003.
6. H. Masuda, M. Satoh, "Fabrication of Gold Nanodot Array Using Anodic Porous Alumina as an Evaporation Mask," Jpn, J. Appl. Phys, vol. 35, pp. L126-L129, 1996.