Ultra-low resistance-area-product in CoFeB/MgO/CoFeB magnetic tunnel junctions

INTERMAG 2006 - IEEE International Magnetics Conference

Volumn , Issue , 2006, Pages 281-

  Nagamine, Y ^a   Maehara, H ^a   Tsunekawa, K ^a   Djayaprawira, D D ^a   Watanabe, N ^a   Yuasa, S ^b,c   Ando, K ^b  

^a Canon ANELVA Technix Corporation   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 50249156060     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/INTMAG.2006.375863     Document Type: Conference Paper

References (5)

1. M. Takagishi, et. al., IEEE Trans. Magn., 38, 2277 (2002).
2. K. Tsunekawa, et al., Appl. Phys. Lett., 87, 072503 (2005).
3. S. Yuasa, et al., Presented at 50th MMM Conf. 2005, ED-01.
4. S. Ikeda, et al, Jpn. J. Appl. Phys., 44, L1442 (2005).
5. D. C. Worledge, et al., Appl. Phys. Lett. 83, 84 (2003).