-
3
-
-
0038044870
-
-
0003-6951
-
P. von Allmen, D. J. Sadler, C. Jensen, N. P. Ostrom, S. T. McCain, B. A. Vojak, and J. G. Eden, Appl. Phys. Lett. 82, 4447 (2003). 0003-6951
-
(2003)
Appl. Phys. Lett.
, vol.82
, pp. 4447
-
-
Von Allmen, P.1
Sadler, D.J.2
Jensen, C.3
Ostrom, N.P.4
McCain, S.T.5
Vojak, B.A.6
Eden, J.G.7
-
4
-
-
0037738491
-
-
0003-6951
-
P. von Allmen, S. T. McCain, N. P. Ostrom, B. A. Jovak, J. G. Eden, F. Zenhausern, C. Jensen, and M. Oliver, Appl. Phys. Lett. 82, 2562 (2003). 0003-6951
-
(2003)
Appl. Phys. Lett.
, vol.82
, pp. 2562
-
-
Von Allmen, P.1
McCain, S.T.2
Ostrom, N.P.3
Jovak, B.A.4
Eden, J.G.5
Zenhausern, F.6
Jensen, C.7
Oliver, M.8
-
7
-
-
21044448827
-
-
0022-3727 10.1088/0022-3727/38/11/007.
-
T. Yokoyama, S. Hamada, S. Ibuka, K. Yasuoka, and S. Ishii, J. Phys. D 0022-3727 10.1088/0022-3727/38/11/007 38, 1684 (2005).
-
(2005)
J. Phys. D
, vol.38
, pp. 1684
-
-
Yokoyama, T.1
Hamada, S.2
Ibuka, S.3
Yasuoka, K.4
Ishii, S.5
-
9
-
-
33947620097
-
-
0963-0252 10.1088/0963-0252/16/1/004.
-
X. Aubert, G. Bauville, J. Guillon, B. Lacour, V. Puech, and A. Rousseau, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/16/1/004 16, 23 (2007).
-
(2007)
Plasma Sources Sci. Technol.
, vol.16
, pp. 23
-
-
Aubert, X.1
Bauville, G.2
Guillon, J.3
Lacour, B.4
Puech, V.5
Rousseau, A.6
-
10
-
-
33645514477
-
-
0022-3727 10.1088/0022-3727/39/8/021.
-
A. Rousseau and X. Aubert, J. Phys. D 0022-3727 10.1088/0022-3727/39/8/ 021 39, 1619 (2006).
-
(2006)
J. Phys. D
, vol.39
, pp. 1619
-
-
Rousseau, A.1
Aubert, X.2
-
11
-
-
19144372659
-
-
0003-6951
-
S. -J. Park, J. G. Eden, J. Chen, and C. Liu, Appl. Phys. Lett. 85, 4869 (2004). 0003-6951
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 4869
-
-
Park, S.-J.1
Eden, J.G.2
Chen, J.3
Liu, C.4
-
13
-
-
84889416744
-
-
2nd ed. (Wiley, Hoboken, NJ)
-
M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, Hoboken, NJ, 2005), pp. 538-539.
-
(2005)
Principles of Plasma Discharges and Materials Processing
, pp. 538-539
-
-
Lieberman, M.A.1
Lichtenberg, A.J.2
-
14
-
-
0034817956
-
-
0013-5194
-
S. -J. Park, J. Chen, C. Liu, and J. G. Eden, Electron. Lett. 37, 171 (2001). 0013-5194
-
(2001)
Electron. Lett.
, vol.37
, pp. 171
-
-
Park, S.-J.1
Chen, J.2
Liu, C.3
Eden, J.G.4
-
15
-
-
0036773566
-
-
1057-7157 10.1109/JMEMS.2002.802907.
-
J. Chen, S. -J. Park, J. G. Eden, and C. Liu, J. Microelectromech. Syst. 1057-7157 10.1109/JMEMS.2002.802907 11, 536 (2002).
-
(2002)
J. Microelectromech. Syst.
, vol.11
, pp. 536
-
-
Chen, J.1
Park, S.-J.2
Eden, J.G.3
Liu, C.4
-
16
-
-
50249167599
-
-
18th International Symposium on Plasma Chemistry, ISPC, (unpublished).
-
T. Dufour, R. Dussart, M. Mandra, and L. J. Overzet, 18th International Symposium on Plasma Chemistry, ISPC, 2007 (unpublished).
-
(2007)
-
-
Dufour, T.1
Dussart, R.2
Mandra, M.3
Overzet, L.J.4
|