Inorganic color filters by MOCVD for CMOS imager and colorimetry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7001, Issue , 2008, Pages

  Guerroudj, Samir ^a,b   Roy, François ^a   Deschanvres, Jean Luc ^b  

^a STMICROELECTRONICS   (France)

^b LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

CMOS image sensor; Color reconstruction; MOCVD aerosol pyrolysis; Optical simulations

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COLOR; COLOR FILMS; IRON ORES; OPTICAL PROPERTIES; ORGANOMETALLICS; OXIDE MINERALS; PHOTONICS; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; THICK FILMS; THIN FILMS; WAVE FILTERS;

CMOS IMAGE SENSOR; CMOS IMAGER; COLOR FILTERING; COLOR RECONSTRUCTION; MOCVD AEROSOL PYROLYSIS; OPTICAL SIMULATIONS; ORGANOMETALLIC PRECURSORS; PHYSICO-CHEMICAL CHARACTERISTICS; RED , GREEN AND BLUE;

FUSED SILICA;

EID: 50249108922     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.780546     Document Type: Conference Paper

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