Fabrication of free-standing fullerene nanowire using direct electron beam writing and sacrificial dry etching

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2008, Pages 689-692

  Tsuchiya, T ^a   Jomori, T ^a   Ura, Y ^a   Sugano, K ^a   Tabata, O ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; ELECTRIC WIRE; ELECTRON BEAMS; ELECTRON OPTICS; FULLERENES; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURES; OPTICAL DESIGN; PARTICLE BEAMS; PLASMA ETCHING;

DIRECT ELECTRON BEAM WRITING; DRY-ETCHING; FULLERENE; INTERNATIONAL CONFERENCES; MICRO-ELECTRO MECHANICAL SYSTEMS; NANO WIRES;

REACTIVE ION ETCHING;

EID: 50149111129     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2008.4443750     Document Type: Conference Paper

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