High-aspect-ratio through-hole array microfabricated in a PMMA plate for monodisperse emulsion production

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1349-1357

  Kobayashi, Isao ^a   Hirose, Sayumi ^b   Katoh, Takanori ^b   Zhang, Yanping ^b   Uemura, Kunihiko ^a   Nakajima, Mitsutoshi ^c  

^a NATIONAL FOOD RESEARCH INSTITUTE   (Japan)

^b SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DROP FORMATION; DROPS; EMULSIFICATION; ESTERS; FLUID MECHANICS; OPTICAL DESIGN; SEMICONDUCTOR COUNTERS; X RAY LITHOGRAPHY;

A-COEFFICIENT; COEFFICIENT OF VARIATION; DROPLET DIAMETERS; DROPLET PRODUCTION; EMULSION PRODUCTION; HIGH ASPECT RATIOS; MC EMULSIFICATION; MICROCHANNEL EMULSIFICATION; MONO DISPERSED; MONODISPERSE EMULSIONS; POLY-METHYL METHACRYLATE; PROMISING TECHNIQUE; SYNCHROTRON RADIATION (SR); THROUGH-HOLES; W/O EMULSIONS; WATER-IN-OIL EMULSIONS;

ELECTRON BEAM LITHOGRAPHY;

DROPS; EMULSIFICATION; EMULSIONS; ESTERS; ETCHING; FLUID MECHANICS; LITHOGRAPHY; MICROSTRUCTURE; POLYMETHYL METHACRYLATE; SINGLE CRYSTALS; WATER REPELLENCE;

EID: 49949102039     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0526-7     Document Type: Conference Paper

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