Application of micro structured photosensitive glass for the gravure printing process

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1635-1639

  Brokmann, U ^a   Sonnichsen K ^a   Hulsenberg D ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CELLS; CHEMICAL STABILITY; CYTOLOGY; GLASS; INK; LIGHT SENSITIVE MATERIALS; MECHANICAL STABILITY; OFFSET PRINTING; OPTICAL DESIGN; OPTICAL PROPERTIES; PHOTORESISTS; PHOTOSENSITIVITY; PRINTING;

CELL GEOMETRIES; CHEMICAL-; DOT STRUCTURES; FLEXIBLE SUBSTRATES; GLASS SUBSTRATES; GRAVURE PRINTING; HIGH ASPECT RATIO; HIGH-TEMPERATURE TREATMENTS; MICRO-MECHANICAL; OPTICAL COMPONENTS;

PHOTOSENSITIVE GLASS;

CYTOLOGY; GLASS; GRAVURE PRINTING; INK; MICROSTRUCTURE; OFFSET PRINTING; OPTICAL PROPERTIES; PHOTOSENSITIVITY;

EID: 49949098109     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-008-0602-7     Document Type: Conference Paper

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