A double inductively coupled low-pressure plasma for sterilization of medical implant materials;Doppelt induktiv gekoppeltes niederdruckplasma zur sterilisation von medizinischen implantatmaterialien

Biomedizinische Technik

Volumn 53, Issue 4, 2008, Pages 199-203

  Hauser, Jörg ^a   Halfmann, Helmut ^b   Awakowicz, Peter ^b   Köller, Manfred ^a   Esenwein, Stefan A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Medical implant sterilization; Plasma sterilization; Plasma treatment

Indexed keywords

ALUMINUM ALLOYS; BACTERIOLOGY; CHROMIUM ALLOYS; COATINGS; ELECTROMAGNETIC INDUCTION; METAL IMPLANTS; MOLYBDENUM ALLOYS; NIOBIUM ALLOYS; NONMETALLIC MATRIX COMPOSITES; PLASMA APPLICATIONS; STERILIZATION (CLEANING); TERNARY ALLOYS; TITANIUM ALLOYS; ULTRAHIGH MOLECULAR WEIGHT POLYETHYLENES;

BACILLUS ATROPHAEUS; LOW PRESSURE PLASMA; MEDICAL IMPLANT DEVICES; MEDICAL IMPLANT STERILIZATION; PLASMA STERILIZATION; PLASMA TREATMENT; STERILIZATION PROCESS; THERMOPLASTIC MATERIALS;

ELECTRIC DISCHARGES;

ALLOY; ARGON; HYDROGEN; NITROGEN; OXYGEN; ULTRA HIGH MOLECULAR WEIGHT POLYETHYLENE;

ARTICLE; BACILLUS; BACILLUS ATROPHAEUS; BACTERIAL SPORE; COLONY FORMING UNIT; GAS MIXING; IMPLANT; INDUCTIVELY COUPLED LOW PRESSURE PLASMA; INSTRUMENT STERILIZATION; MATERIALS TESTING; SURFACE PROPERTY;

EID: 49949089009     PISSN: 00135585     EISSN: None     Source Type: Journal    
DOI: 10.1515/BMT.2008.024     Document Type: Article

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