-
1
-
-
0035817159
-
Copper metallization of low-dielectric- constant a-SiCOF films for ULSI interconnects
-
Ding, S.-J., Q.-Q. Zhang, D. W. Zhang, J.-T. Wang, W. W. Lee, "Copper metallization of low-dielectric- constant a-SiCOF films for ULSI interconnects", J. Phys.: Condens. Matter., Vol. 13, pp. 6595-6608, 2001.
-
(2001)
J. Phys.: Condens. Matter
, vol.13
, pp. 6595-6608
-
-
Ding, S.-J.1
Zhang, Q.-Q.2
Zhang, D.W.3
Wang, J.-T.4
Lee, W.W.5
-
2
-
-
33244483591
-
A study of copper electroplating of the submicrometer scale patterns
-
Lee, U.-H., H.-J. Lee, H.-J. Sohn, and T. Kang, "A study of copper electroplating of the submicrometer scale patterns, Electrochemical and Solid-State Letters, Vol. 9, No. 4, pp. C65-C68, 2006.
-
(2006)
Electrochemical and Solid-State Letters
, vol.9
, Issue.4
-
-
Lee, U.-H.1
Lee, H.-J.2
Sohn, H.-J.3
Kang, T.4
-
3
-
-
0037207708
-
Ta metallization of Si-O-C substrate and Cu metallization of TaÕSi-O-C multilayer
-
Tong, J., D. Martini, N. Magtoto, J. Kelber, "Ta metallization of Si-O-C substrate and Cu metallization of TaÕSi-O-C multilayer", J. Vac. Sci. Technol. B Vol. 21, No. 1, pp. 293-300, 2003.
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, Issue.1
, pp. 293-300
-
-
Tong, J.1
Martini, D.2
Magtoto, N.3
Kelber, J.4
-
4
-
-
9144249214
-
Comparison of induced stresses due to electroless versus sputtered copper interconnect technology
-
McNally, P. J., J. Kanatharana, B. H. W. Toh, D. W. McNeill, T. Tuomi, A. N. Danilewsky, L. Knuuttila, J. Riikonen, J. Toivonen, "Comparison of induced stresses due to electroless versus sputtered copper interconnect technology", Semicond. Sci. Technol., Vol. 19, pp. 1280-1284, 2004.
-
(2004)
Semicond. Sci. Technol
, vol.19
, pp. 1280-1284
-
-
McNally, P.J.1
Kanatharana, J.2
Toh, B.H.W.3
McNeill, D.W.4
Tuomi, T.5
Danilewsky, A.N.6
Knuuttila, L.7
Riikonen, J.8
Toivonen, J.9
-
5
-
-
10844249432
-
Bottom-up fill for submicrometer copper via holes of ULSIs by electroless plating
-
Wang, Z., O. Yaegashi, H. Sakaue, T. Takahagi, S. Shingubara, "Bottom-up fill for submicrometer copper via holes of ULSIs by electroless plating", Journal of the Electrochemical Society, Vol. 151, No. 12, pp. C781-C785, 2004.
-
(2004)
Journal of the Electrochemical Society
, vol.151
, Issue.12
-
-
Wang, Z.1
Yaegashi, O.2
Sakaue, H.3
Takahagi, T.4
Shingubara, S.5
-
6
-
-
0035331273
-
Engineering the surface and interface of parylene C coatings by low-temperature plasmas
-
Yu, Q., J. Deffeyes, H. Yasuda, "Engineering the surface and interface of parylene C coatings by low-temperature plasmas", Progress in Organic Coatings, Vol. 41, pp. 247-253, 2001.
-
(2001)
Progress in Organic Coatings
, vol.41
, pp. 247-253
-
-
Yu, Q.1
Deffeyes, J.2
Yasuda, H.3
-
7
-
-
13844256769
-
Effects of ion bombardment with reactive gas environment on adhesion of Au films to parylene C film
-
Seong, J.W., K.W. Kim, Y.W. Beag, S.K. Koh, K.H. Yoon, J.H. Lee, "Effects of ion bombardment with reactive gas environment on adhesion of Au films to parylene C film", Thin Solid Films, Vol.476, pp. 386-390, 2005.
-
(2005)
Thin Solid Films
, vol.476
, pp. 386-390
-
-
Seong, J.W.1
Kim, K.W.2
Beag, Y.W.3
Koh, S.K.4
Yoon, K.H.5
Lee, J.H.6
-
8
-
-
18544409090
-
Plasma-deposited parylene-like thin films: Process and material properties
-
Vols
-
Mitsu, B., S. Bauer-Gogonea, H. Leonhartsberger, M. Lindner, S. Bauer, G. Dinescu, "Plasma-deposited parylene-like thin films: process and material properties", Surface and Coatings Technology, Vols. 174-175, pp. 124-130, 2003.
-
(2003)
Surface and Coatings Technology
, vol.174-175
, pp. 124-130
-
-
Mitsu, B.1
Bauer-Gogonea, S.2
Leonhartsberger, H.3
Lindner, M.4
Bauer, S.5
Dinescu, G.6
-
10
-
-
0036118066
-
Dielectric charging effects on parylene electrostatic actuators
-
Yao, T. -J., K. Walsh, Y. -C. Tai, "Dielectric charging effects on parylene electrostatic actuators", Proc. of 15th IEEE. Int. Conf. on MEMS (MEMS2002), p. 614, 2002.
-
(2002)
Proc. of 15th IEEE. Int. Conf. on MEMS (MEMS2002)
, pp. 614
-
-
Yao, T.-J.1
Walsh, K.2
Tai, Y.-C.3
-
11
-
-
0038155499
-
Robust Parylene-to-silicon mechanical anchoring
-
Liger, M., D. Rodger and Y.-C Tai, "Robust Parylene-to-silicon mechanical anchoring", Proc. of 16th IEEE Int. Conf. on Micro Electro Mechanical Systems (MEMS '03), p. 602, 2003.
-
(2003)
Proc. of 16th IEEE Int. Conf. on Micro Electro Mechanical Systems (MEMS '03)
, pp. 602
-
-
Liger, M.1
Rodger, D.2
Tai, Y.-C.3
-
13
-
-
4344595818
-
Parylene micromolding, a rapid and low-cost fabrication method for parylene microchannel
-
Noh, H. -S., Y. Huang, P. J. Hesketha, "Parylene micromolding, a rapid and low-cost fabrication method for parylene microchannel", Sensor. Actuat. B Vol. 102, p. 78, 2004.
-
(2004)
Sensor. Actuat. B
, vol.102
, pp. 78
-
-
Noh, H.-S.1
Huang, Y.2
Hesketha, P.J.3
-
14
-
-
49949088951
-
-
Hardt, D., B. Ganesan, W. Qi, M. Dirckx, A. Rzepniewski, Process control in micro-embossing: A review, innovation in manufacturing systems and Technology (IMST) 2004, http://hdl.handle.net/1721.1 /3917.
-
Hardt, D., B. Ganesan, W. Qi, M. Dirckx, A. Rzepniewski, "Process control in micro-embossing: A review, innovation in manufacturing systems and Technology (IMST) 2004, http://hdl.handle.net/1721.1 /3917.
-
-
-
-
15
-
-
0035422490
-
A contribution to the flow behaviour of thin polymer films during hot embossing lithography
-
Scheer, H.-C., H. Schulz, A contribution to the flow behaviour of thin polymer films during hot embossing lithography, Microelectron. Eng., Vol. 56, p. 311, 2001.
-
(2001)
Microelectron. Eng
, vol.56
, pp. 311
-
-
Scheer, H.-C.1
Schulz, H.2
-
16
-
-
29044433682
-
Issues in Nanoimprint Processes: The Imprint Pressure
-
Sheer, H.-C., N. Bogdanski, M. Wissen, "Issues in Nanoimprint Processes: the Imprint Pressure", Jpn. J. Appl. Phys., Vol. 44, No. 7B, pp. 5609-5616,2005.
-
(2005)
Jpn. J. Appl. Phys
, vol.44
, Issue.7 B
, pp. 5609-5616
-
-
Sheer, H.-C.1
Bogdanski, N.2
Wissen, M.3
-
17
-
-
2942558559
-
Recent progress in nanoimprint technology and its applications
-
Guo, L. J., "Recent progress in nanoimprint technology and its applications", J. Phys. D: Appl. Phys., Vol. 37, p. R123, 2005.
-
(2005)
J. Phys. D: Appl. Phys
, vol.37
-
-
Guo, L.J.1
-
18
-
-
27944505464
-
Impact of polymer film thickness and cavity size on polymer flow during embossing: Toward process design rules for nanoimprint lithography
-
Rowland, D., A. C. Sun, P. R. Schunk, W. P. King, "Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography", J. Micromech. Microeng., Vol. 15, p. 2414, 2005.
-
(2005)
J. Micromech. Microeng
, vol.15
, pp. 2414
-
-
Rowland, D.1
Sun, A.C.2
Schunk, P.R.3
King, W.P.4
-
19
-
-
33646029113
-
Multi-layered resist process in nanoimprint lithography for high aspect ratio pattern
-
Konishi, T., H. Kikuta, H. Kawata, Y. Hirai, "Multi-layered resist process in nanoimprint lithography for high aspect ratio pattern, Microelectron. Eng., Vol. 83, pp. 869-872, 2006.
-
(2006)
Microelectron. Eng
, vol.83
, pp. 869-872
-
-
Konishi, T.1
Kikuta, H.2
Kawata, H.3
Hirai, Y.4
-
20
-
-
49949106716
-
Parylene Coating System
-
Three Bond Co, Ltd, Threebond Technical News, in japanese
-
Three Bond Co., Ltd, "Parylene Coating System", Threebond Technical News, No.39, pp. 1-10, http://www.threebond.co.jp/ja/technical/ technicalnews/index.html (in japanese).
-
, Issue.39
, pp. 1-10
-
-
-
21
-
-
33748763897
-
Fluorinated diamond-like carbon coating as antisticking layer on nanoimprint mold
-
Nakamatsu, K., N. Yamada, K. Kanda, Y. Haruyama, S. Matsui, "Fluorinated diamond-like carbon coating as antisticking layer on nanoimprint mold", Jpn. J. Appl. Phys., Vol. 45, No. 35, pp. L954- L956, 2006.
-
(2006)
Jpn. J. Appl. Phys
, vol.45
, Issue.35
-
-
Nakamatsu, K.1
Yamada, N.2
Kanda, K.3
Haruyama, Y.4
Matsui, S.5
|