Uranium Oxide as a Highly Reflective Coating from 100-400 eV

AIP Conference Proceedings

Volumn 705, Issue , 2004, Pages 796-799

  Sandberg, Richard L ^a   Allred, David D ^a   Bissell, Luke J ^a   Johnson, Jed E ^a   Turley, R Steven ^a  

^a Brigham Young University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 49849083050     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.1757916     Document Type: Conference Paper

References (11)

1. D. D. Allred et al., "Highly Reflective Uranium Mirrors for Astrophysics Applications," in X-ray Mirrors, Crystals and Multilayers, Andreas K. Freund, Albert T. Macrander, Tetsuya Ishikawa, and James. T. Wood, Editors, Proc. SPIE 4782, pp. 212-223, SPIE, Bellingham, WA, 2002.
2. D. D. Allred, R. S. Turley, and M. B. Squires, "Dual-function EUV multilayer mirrors for the IMAGE mission," in EUV, X-Ray and Neutron Optics, Carolyn A. Macdonald, Kenneth A. Goldberg, Juan R. Maldonado, H. Heather Chen-Mayer, and Stephen P. Vernon, Editors, Proceedings of SPIE 3767, pp. 280-287, SPIE, Bellingham, WA, 1999.
3. Matthew B. Squires. "The EUV Optical Constants of Sputtered U and a-Si," Honors Thesis, Brigham Young University, Provo, UT, April 1999. http://volta. byu. edu
4. B. R. Sandel et al., Space Science Reviews 91, pp. 197-242 (2000).
5. David Oliphant (oliphantd@byui. edu), "Characterization of Uranium, Uranium Oxide and Silicon Multilayer Films," Masters thesis, Dept. of Physics and Astronomy, BYU, Provo, UT 2000. Contact the BYU HBL library at http://www.lib. byu. edu/hbll/ or in partial form at http://www.byui. edu/Ricks/employee/oliphantd/.
6. http://www-cxro. lbl. gov/optical-constants/mirror2. html, June-July 2003, using the option thick mirrors.
7. Shannon Lunt, "Determining the Indices of Refraction of Reactively Sputtered Uranium Dioxide Thing Films from 46 to 584 Angstroms," Masters Thesis, Dept. of Physics and Astronomy, BYU, Provo, UT 2002. Contact the BYU HBL library at http://www.lib. byu. edu/hbll/
8. R. L. Sandberg et al., "A Comparison of Uranium Oxide and Nickel as Single-layer Reflectors from 2. 7 to 11. 6 Nanometers," in Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, Ali M. Khounsary, Udo Dinger, Kazuya Ota, Editors, Proc. SPIE 5193, SPIE, Bellingham, WA, 2003.
9. Program for EUV and X-ray reflectance calculations, courtesy of Prof. David L. Windt: windt@astro. columbia. edu. http://cletus. phys. columbia. edu/windt/idl.
10. http://www-cxro. lbl. gov/als6. 3. 2/, July, 2003 or contact Eric Gullikson from the webpage for additional questions.
11. J. H. Underwood et al. Rev. Sci. Instrum., 67 (9), pp. 1-5 (1996).