Deposition of SiO2 thin films by atmospheric pressure glow plasma on polycarbonate

Journal of Photopolymer Science and Technology

Volumn 21, Issue 2, 2008, Pages 263-266

  Masuda, Shohei ^a   Tanaka, Kunihito ^a   Kogoma, Masuhiro ^a  

^a NONE

Author keywords

Plasma CVD; Polycarbonate; SiO2

Indexed keywords

EID: 49749149730     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.263     Document Type: Article

References (1)

1. Y. Sawada, S. Ogawa and M. Kogoma, J. Phys. D: Appl.Phys. 28 (1995) 1661