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Volumn 18, Issue 8, 2008, Pages

The fabrication of x-ray masks using proton beam writing

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPLATING; FABRICATION; GOLD; ION BEAM LITHOGRAPHY; MASKS; METALLIZING; OPTICAL DESIGN; PARTICLE BEAMS; PHOTORESISTS; PROTON BEAMS; PROTONS; X RAY LITHOGRAPHY;

EID: 49749124203     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/8/085010     Document Type: Article
Times cited : (9)

References (17)
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    • (1986) Microelectron. Eng. , vol.4 , Issue.1 , pp. 35-56
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  • 3
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    • Fabrication of X-ray masks and applications for optical switch molding
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  • 6
    • 33645400853 scopus 로고    scopus 로고
    • Proton beam writing of three-dimensional nanostructures in hydrogen silsesquioxane
    • van Kan J A, Bettiol A A and Watt F 2006 Proton beam writing of three-dimensional nanostructures in hydrogen silsesquioxane Nano Lett. 6 579-82
    • (2006) Nano Lett. , vol.6 , Issue.3 , pp. 579-582
    • Van Kan, J.A.1    Bettiol, A.A.2    Watt, F.3
  • 7
    • 0041780667 scopus 로고    scopus 로고
    • Three dimensional nanolithography using proton beam writing
    • van Kan J A, Bettiol A A and Watt F 2003 Three dimensional nanolithography using proton beam writing Appl. Phys. Lett. 83 1629-31
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    • Van Kan, J.A.1    Bettiol, A.A.2    Watt, F.3
  • 8
    • 4043173302 scopus 로고    scopus 로고
    • Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing
    • Ansari K, van Kan J A, Bettiol A A and Watt F 2004 Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing Appl. Phys. Lett. 85 476-8
    • (2004) Appl. Phys. Lett. , vol.85 , Issue.3 , pp. 476-478
    • Ansari, K.1    Van Kan, J.A.2    Bettiol, A.A.3    Watt, F.4
  • 12
    • 0035505972 scopus 로고    scopus 로고
    • Development behaviours and microstructure quality of downward-development in deep x-ray lithography
    • Cheng C M and Chen R H 2001 Development behaviours and microstructure quality of downward-development in deep x-ray lithography J. Micromech. Microeng. 11 692-6
    • (2001) J. Micromech. Microeng. , vol.11 , Issue.6 , pp. 692-696
    • Cheng, C.M.1    Chen, R.H.2
  • 14
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    • Sub 100 nm proton beam micromachining: Theoretical calculations on resolution limits
    • van Kan J A, Sum T C, Osipowicz T and Watt F 2000 Sub 100 nm proton beam micromachining: theoretical calculations on resolution limits Nucl. Instrum. Methods Phys. Res. B 161-163 366-70
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  • 15
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    • DoseSim: Microsoft-Windows graphical user interface for using synchrotron x-ray exposure and subsequent development in the LIGA process
    • Meyer P, Schulz J and Hahn L 2003 DoseSim: Microsoft-Windows graphical user interface for using synchrotron x-ray exposure and subsequent development in the LIGA process Rev. Sci. Instrum. 74 1113-9
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  • 17
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.