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Volumn 4, Issue 7, 2007, Pages 2540-2543
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Direct growth of a-plane GaN on r-plane sapphire substrate by metalorganic vapor phase epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
A-PLANE;
BUFFER LAYERS;
DIRECT GROWTH;
FLAT SURFACES;
GAN ISLANDS;
GROWTH CONDITIONS;
HIGH-DENSITY;
HIGH-TEMPERATURE GROWTH;
INITIAL STAGES;
LATERAL GROWTH RATE;
METAL-ORGANIC VAPOR PHASE EPITAXY;
NITRIDE SEMICONDUCTORS;
NON-POLAR;
PLANE SAPPHIRE;
SURFACE MORPHOLOGIES;
V/III RATIO;
CORUNDUM;
CRYSTAL GROWTH;
CRYSTALS;
ECOLOGY;
ELECTRIC CONDUCTIVITY;
EPITAXIAL GROWTH;
GALLIUM NITRIDE;
METALLORGANIC VAPOR PHASE EPITAXY;
NITRIDES;
SAPPHIRE;
SEMICONDUCTING GALLIUM;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR MATERIALS;
SUBSTRATES;
VAPORS;
GALLIUM ALLOYS;
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EID: 49749104255
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200674829 Document Type: Conference Paper |
Times cited : (5)
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References (10)
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