Gas sensitive porous silicon sensor using rapid thermal annealing screen printing contacts

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 4, Issue 6, 2007, Pages 2068-2072

  Mahmoudi, Be ^a   Gabouze, N ^a   Haddadi, M ^b   Cheraga, H ^a   Belhousse, S ^a  

^a L'Unite de Developpement de la Technologie du Silicium   (Algeria)

^b ECOLE NATIONALE POLYTECHNIQUE   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED SURFACE; BACK CONTACTS; GAS SENSORS; I-V MEASUREMENTS; METALLIZATION; POROUS SILICON (PS); THICK-FILM TECHNOLOGY;

ANNEALING; CEMENTS; NONMETALS; OPTICAL DESIGN; PRINTING; PRINTING PRESSES; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SCREEN PRINTING; SENSORS; SILICON; SURFACE ANALYSIS;

POROUS SILICON;

EID: 49749085166     PISSN: 18626351     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssc.200674373     Document Type: Conference Paper

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