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Applied Physics A: Materials Science and Processing

Volumn 93, Issue 1, 2008, Pages 11-15

Fabrication of three-dimensional photonic crystal structures containing an active nonlinear optical chromophore

(7) Farsari, M a Ovsianikov, A b Vamvakaki, M a,c Sakellari, I a,c Gray, D a Chichkov, B N a,b Fotakis, C a,c

a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER (Greece)

b LASER ZENTRUM HANNOVER E V (Germany)

c UNIVERSITY OF CRETE (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; CHROMOPHORES; COLLOIDS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; CRYSTALS; GELATION; LASERS; LIGHT SENSITIVE MATERIALS; MONOMERS; OPTICAL DESIGN; OPTICAL PROPERTIES; PHOTONICS; PHOTONS; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; POLYMERIZATION; POLYMERS; POWDERS; SHRINKAGE; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; THREE DIMENSIONAL;

DIRECT LASER WRITING; DISPERSE RED 1; FABRICATION OF PHOTONIC CRYSTALS; LASER PROCESSING; NEAR INFRA-RED; NONLINEAR OPTICAL; PHOTONIC CRYSTAL STRUCTURES; PHOTOSENSITIVE MATERIALS; PROMISING TECHNIQUE; SHRINKAGE COMPENSATION; SILICA SOL GELS; SUPPORT STRUCTURES; THREE-DIMENSIONAL PHOTONIC CRYSTALS; TWO-PHOTON POLYMERIZATION;

PHOTONIC CRYSTALS;

EID: 49649115704 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4642-8 Document Type: Article

Times cited : (47)

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