-
1
-
-
49549098958
-
-
R. Singhal, A. Balijepalli, A. Subramaniam, F. Liu, S. Nassif, Y. Cao, Modeling and analysis of line-edge roughness effect for post-lithography circuit simulation, DAC, 2007.
-
R. Singhal, A. Balijepalli, A. Subramaniam, F. Liu, S. Nassif, Y. Cao, "Modeling and analysis of line-edge roughness effect for post-lithography circuit simulation," DAC, 2007.
-
-
-
-
4
-
-
49549107439
-
-
International technology roadmap for semiconductors 2006, http://public.itrs.net
-
(2006)
-
-
-
5
-
-
0038158890
-
Layout impact of resolution enhancement techniques: Impediment or opportunity?
-
L. W. Liebmann, "Layout impact of resolution enhancement techniques: impediment or opportunity?," ISPD, pp.110-117, 2003.
-
(2003)
ISPD
, pp. 110-117
-
-
Liebmann, L.W.1
-
6
-
-
4444224690
-
Toward a methodology for manufacturability-driven design rule exploration
-
L. Capodieci, P. Gupta, A. B. Kahng, D. Sylvester and J. Yang, "Toward a methodology for manufacturability-driven design rule exploration," IEEE/ACM DAC, pp. 311-316, 2004.
-
(2004)
IEEE/ACM DAC
, pp. 311-316
-
-
Capodieci, L.1
Gupta, P.2
Kahng, A.B.3
Sylvester, D.4
Yang, J.5
-
7
-
-
0346778720
-
Manufacturing aware physical design
-
P. Gupta and A. B. Kahng, "Manufacturing aware physical design," IEEE/ACM ICCAD, pp. 681-687, 2003.
-
(2003)
IEEE/ACM ICCAD
, pp. 681-687
-
-
Gupta, P.1
Kahng, A.B.2
-
8
-
-
0242693873
-
Lithography driven layout of logic cells for 65nm node
-
D. Pramanik, M.Cote, "Lithography driven layout of logic cells for 65nm node," SPIE, Vol. 5042, pp 126-134, 2003.
-
(2003)
SPIE
, vol.5042
, pp. 126-134
-
-
Pramanik, D.1
Cote, M.2
-
9
-
-
34548858419
-
Towards a new nanoelectronic cosmology
-
J. Hartmann., "Towards a new nanoelectronic cosmology," ISSCC, pp. 31-37, 2007.
-
(2007)
ISSCC
, pp. 31-37
-
-
Hartmann, J.1
-
10
-
-
33751087554
-
-
D. G. Flagello and B. Arnold, Optical lithography for nanotechnology, SPIE, 6327, pp. 63270D, 2006.F. M. Schellenberg, L. Capodieci, Impact of RET on physical design, ISPD, pp. 52-55, 2001.
-
D. G. Flagello and B. Arnold, "Optical lithography for nanotechnology," SPIE, Vol. 6327, pp. 63270D, 2006.F. M. Schellenberg, L. Capodieci, "Impact of RET on physical design," ISPD, pp. 52-55, 2001.
-
-
-
-
11
-
-
28744452518
-
Design for manufacturing strategies to bring silicon process to 32nm node
-
J. Fung Chen, "Design for manufacturing strategies to bring silicon process to 32nm node," IEEE ISSM, pp. 101-104, 2005.
-
(2005)
IEEE ISSM
, pp. 101-104
-
-
Fung Chen, J.1
-
12
-
-
49549118844
-
Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction
-
S. Roy, D. Van, D. Broeke, "Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction," SPIE, Vol. 4, pp. 023003, 2005.
-
(2005)
SPIE
, vol.4
, pp. 023003
-
-
Roy, S.1
Van, D.2
Broeke, D.3
-
13
-
-
0034831414
-
Impact of RET on physical design
-
F. M. Schellenberg, L. Capodieci, "Impact of RET on physical design," ISPD, pp. 52-55, 2001.
-
(2001)
ISPD
, pp. 52-55
-
-
Schellenberg, F.M.1
Capodieci, L.2
-
14
-
-
0036030174
-
Understanding the forbidden pitch phenomenon and assist feature placement
-
X. Shi, S. Hsu et al, "Understanding the forbidden pitch phenomenon and assist feature placement," SPIE, Vol. 4689, pp. 985-996, 2002.
-
(2002)
SPIE
, vol.4689
, pp. 985-996
-
-
Shi, X.1
Hsu, S.2
-
15
-
-
27944510181
-
RADAR: RET-aware detailed routing using fast lithography simulations
-
J. Mitra, P. Yu, D. Z. Pan, "RADAR: RET-aware detailed routing using fast lithography simulations," IEEE/ ACM DAC, pp 369-372, 2005.
-
(2005)
IEEE/ ACM DAC
, pp. 369-372
-
-
Mitra, J.1
Yu, P.2
Pan, D.Z.3
|