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Volumn 51, Issue , 2008, Pages 376-378

A 153Mb-SRAM design will dynamic stability enhancement and leakage reduction in 45nm high-κ metal-gate CMOS technology

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; LOGIC DESIGN; STATIC RANDOM ACCESS STORAGE;

EID: 49549092261     PISSN: 01936530     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISSCC.2008.4523214     Document Type: Conference Paper
Times cited : (39)

References (6)
  • 1
    • 50249185641 scopus 로고    scopus 로고
    • A 45nm Logic Technology with higk-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging
    • K. Mistry, et al., "A 45nm Logic Technology with higk-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging," IEDM Tech. Dig., 2007.
    • (2007) IEDM Tech. Dig
    • Mistry, K.1
  • 2
    • 18744365842 scopus 로고    scopus 로고
    • SRAM design on 65-nm CMOS Technology with Dynamic Sleep Transistor for Leakage Reduction
    • April
    • K. Zhang, U. Bhattacharya, C. Zhanping et al., "SRAM design on 65-nm CMOS Technology with Dynamic Sleep Transistor for Leakage Reduction," IEEE J. Solid-State Circuits, vol.40, pp. 895-901, April 2005.
    • (2005) IEEE J. Solid-State Circuits , vol.40 , pp. 895-901
    • Zhang, K.1    Bhattacharya, U.2    Zhanping, C.3
  • 3
    • 51349166333 scopus 로고    scopus 로고
    • Penryn: 45-nm Next Generation Intel® Core™ 2 Processor
    • Nov
    • V. George, "Penryn: 45-nm Next Generation Intel® Core™ 2 Processor," ASSOC Dig. Tech. Papers, Nov. 2007.
    • (2007) ASSOC Dig. Tech. Papers
    • George, V.1
  • 4
    • 0034430275 scopus 로고    scopus 로고
    • A 1000-MIPS/W Microprocessor Using Speed-Adaptive Threshold-Volt age CMOS with Forward Bias
    • Feb
    • M. Miyazaki, G. Ono and K. Ishibashi, "A 1000-MIPS/W Microprocessor Using Speed-Adaptive Threshold-Volt age CMOS with Forward Bias," ISSCC Dig. Tech. Papers, pp. 420-421, 475, Feb. 2000.
    • (2000) ISSCC Dig. Tech. Papers , vol.475 , pp. 420-421
    • Miyazaki, M.1    Ono, G.2    Ishibashi, K.3
  • 5
    • 1542359179 scopus 로고    scopus 로고
    • Row-by-Row Dynamic Source-Line Voltage Control (RRDSV) Scheme for Two Orders of Magnitude Leakage Current Reduction of Sub-1-V-VDD SRAM's
    • Aug
    • K.-S. Min, K. Kanda and T. Sakurai, "Row-by-Row Dynamic Source-Line Voltage Control (RRDSV) Scheme for Two Orders of Magnitude Leakage Current Reduction of Sub-1-V-VDD SRAM's," in Symp. Low Power Electronics and Design, pp. 66-71, Aug. 2003.
    • (2003) Symp. Low Power Electronics and Design , pp. 66-71
    • Min, K.-S.1    Kanda, K.2    Sakurai, T.3
  • 6
    • 33846194975 scopus 로고    scopus 로고
    • A 256-Kb Dual-VCC SRAM Building Block in 65-nm CMOS Process with Actively Clamped Sleep Transistor
    • Jan
    • M. Khellah, D. Somasekhar, Y. Ye et al., "A 256-Kb Dual-VCC SRAM Building Block in 65-nm CMOS Process with Actively Clamped Sleep Transistor," IEEE J. Solid-State Circuits, vol.42, pp. 233-242, Jan. 2007.
    • (2007) IEEE J. Solid-State Circuits , vol.42 , pp. 233-242
    • Khellah, M.1    Somasekhar, D.2    Ye, Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.