Analysis of silicon nanowires by laser atom probe tomography prepared by a protected lift-out processing technique

Microscopy and Microanalysis

Volumn 14, Issue SUPPL. 2, 2008, Pages 456-457

  Prosa, T ^a   Alvis, R ^a   Tsakalakos, L ^b   Smentkowski, V ^b  

^a Imago Scientific Instruments   (United States)

^b GE GLOBAL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 49549089768     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927608083761     Document Type: Conference Paper

References (3)

1. D.E. Perea et al., Nano Lett. 6 (2006) 181.
2. R.S. Wagner and W.C. Ellis, Appl. Phys. Lett. 4 (1964) 89.
3. M. K. Miller et al., Micro. Microanal. 13(6) (2007) 428.