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Applied Physics A: Materials Science and Processing

Volumn 92, Issue 4, 2008, Pages 897-902

Near-damage threshold femtosecond laser irradiation of dielectric surfaces: Desorbed ion kinetics and defect dynamics

(3) Costache, Florenta a Eckert, Sebastian a Reif, Jürgen a

a BRANDENBURG UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CRYSTALLOGRAPHY; DEFECT DENSITY; DEFECTS; DESORPTION; FLUORINE COMPOUNDS; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; IONS; IRRADIATION; LASERS; MASS SPECTROMETERS; MASS SPECTROMETRY; SINGLE CRYSTALS; ULTRASHORT PULSES;

COUPLING EFFICIENCIES; DAMAGE THRESHOLDS; DEFECT DYNAMICS; DEFECT LIFETIME; DIELECTRIC SURFACES; EXPERIMENTAL DATA; EXPONENTIAL GROWTH; FEMTO-SECOND LASER PULSES; FEMTOSECOND LASER IRRADIATION; FREE-ELECTRON DENSITY; ION KINETICS; ION YIELDS; MULTI-SHOT; RADIATION-INDUCED DEFECTS; TEMPORAL CHARACTERISTICS; TIME DECAY; TIME-OF FLIGHT MASS SPECTROMETRY;

PULSED LASER APPLICATIONS;

EID: 49449091449 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4632-x Document Type: Article

Times cited : (39)

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