Optimization of diffraction grating profiles in fabrication by electron-beam lithography

Applied Optics

Volumn 43, Issue 27, 2004, Pages 5137-5142

  Okano, Masato ^a   Kikuta, Hisao ^b   Hirai, Yoshihiko ^b   Yamamoto, Kazuya ^a   Yotsuya, Tsutom ^c  

^a NALUX Co Ltd   (Japan)

^b Osaka Prefecture University   (Japan)

^c OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; ESTIMATION; MONTE CARLO METHODS; OPTICAL FIBER FABRICATION; OPTIMIZATION; PHOTORESISTS;

DIFFRACTION EFFICIENCY (DE); GAUSSIAN DISTRIBUTION (GD); PROXIMITY CORRECTION; RIGOROUS COUPLED-WAVE ANALYSIS (RCWA);

DIFFRACTION GRATINGS;

EID: 4944264369     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.43.005137     Document Type: Article

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