Ultra-stable oven designed for x-ray reflectometry and ellipsometry studies of liquid surfaces

Review of Scientific Instruments

Volumn 75, Issue 8, 2004, Pages 2536-2540

  Brown, Matt ^a   Uran, Serif ^a   Law, Bruce ^a   Marschand, Lyle ^b   Lurio, Larry ^b   Kuzmenko, I ^c   Gog, T ^c  

^a KANSAS STATE UNIVERSITY   (United States)

^b NORTHERN ILLINOIS UNIVERSITY   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR PRESSURE; BINARY LIQUID MIXTURES; LIQUID SURFACES; TEMPERATURE SENSING; X-RAY REFLECTOMETRY;

ELLIPSOMETRY; HIGH TEMPERATURE EFFECTS; LIQUIDS; OVENS; REFLECTOMETERS; SURFACE PHENOMENA; TEMPERATURE CONTROL; THERMAL GRADIENTS; THIN FILMS; X RAY SCATTERING;

BINARY MIXTURES;

EID: 4944261319     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1771496     Document Type: Article

References (16)

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6. See D. Beaglehole in Ref. 2.
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14. It should be noted that after the x-ray experiment the chemically resistant Kalrez O-rings had swollen considerably and perhaps teflon-encapsulated O-rings would be a better choice in future.
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