Growth and morphology of low-energy deposited Cu nanocluster films

Reviews on Advanced Materials Science

Volumn 5, Issue 1, 2003, Pages 57-61

  Palasantzas, G ^a   Koch, S A ^a   De Hosson, J Th M ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; CORRELATION METHODS; CRYSTAL GROWTH; DEPOSITION; MORPHOLOGY; PORE SIZE; SILICON; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; X RAY SCATTERING;

COPPER NANOCLUSTER FILMS; HEIGHT DIFFERENCE CORRELATION FUNCTION; SILICON SUBSTRATES; X RAY SCATTERING REFLECTIVITY MEASUREMENT;

NANOSTRUCTURED MATERIALS;

EID: 4944259872     PISSN: 16065131     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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