Platinum silicide phase transformations controlled by a nanometric interfacial oxide layer

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7467-7474

  Conforto, E ^a   Schmid, P E ^a  

^a EPFL   (Switzerland)

Author keywords

Epitaxy; HRTEM; Platinum silicides; Pt2Si; PtSi; Solid solid thermal reaction

Indexed keywords

ANNEALING; ELECTRON DIFFRACTION; EPITAXIAL GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NONMETALS; PLATINUM; SILICA; SILICON; SILICON COMPOUNDS;

ANNEALING TEMPERATURE; EPITAXY; HRTEM; INTERFACIAL OXIDES; NANOMETRIC; PLATINUM SILICIDE; PLATINUM SILICIDES; PT2SI; PTSI; SELECTED-AREA ELECTRON DIFFRACTION; SI SUBSTRATE; SILICIDE FILMS; SILICON OXIDES; SOLID-SOLID THERMAL REACTION; THERMAL REACTION;

OXIDE FILMS;

EID: 49349117340     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.03.033     Document Type: Article

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