Preparation of ordered 2-D hexagonal mesoporous silica with ultra thick pore walls using a novel nonionic organosilicon surfactant

Materials Letters

Volumn 62, Issue 27, 2008, Pages 4245-4247

  Chen, Guodong ^a   Wang, Lingzhi ^a   Chen, Feng ^a   Zhang, Jinlong ^a   Anpo, Mazakazu ^b  

^a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b Osaka Prefecture University   (Japan)

Author keywords

Hexagonal; Hydrothermal stability; Nanomaterial; Polymethylsiloxane; Porosity

Indexed keywords

CALCINATION; HYDROPHOBICITY; PORE PRESSURE; QUAY WALLS; SILANES; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; SURFACE ACTIVE AGENTS; SURFACE CHEMISTRY; WALLS (STRUCTURAL PARTITIONS);

ACIDIC CONDITIONS; HEXAGONAL; HEXAGONAL MESOPOROUS SILICA; HYDROPHOBIC SURFACES; HYDROTHERMAL STABILITIES; HYDROTHERMAL STABILITY; MESOPOROUS; MESOPOROUS SILICA; MICRO-PORES; NANOMATERIAL; NON-IONIC; ORGANOSILICON; POLYMETHYLSILOXANE; PORE WALLS; POROSITY; RECOMBINATION PROCESSES; SILICA SOURCES; XRD PATTERNS;

MESOPOROUS MATERIALS;

EID: 49349085405     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2008.07.018     Document Type: Article

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