The mechanism of electropolishing of niobium in hydrofluoric-sulfuric acid electrolyte

Journal of the Electrochemical Society

Volumn 155, Issue 9, 2008, Pages

  Tian, Hui ^a,b   Corcoran, Sean G ^c   Reece, Charles E ^b   Kelley, Michael J ^a,b  

^a Dept of Economics and Thomas Jefferson Program in Public Policy at the College of William and Mary   (United States)

^b THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

^c Virginia Polytechnic Institute and State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYSIS; ELECTROLYTES; ELECTROLYTIC POLISHING; HYDROFLUORIC ACID; MECHANISMS; SULFURIC ACID; TRANSITION METALS;

ACID ELECTROLYTES; APPLICATIONS.; CATHODE POLARIZATION; ELECTROCHEMICAL ANALYSIS; EP MECHANISM; HF CONCENTRATION; HIGH FIELDS; NIOBIUM CAVITY; NIOBIUM SURFACES; POWER-SUPPLY VOLTAGES; REFERENCE ELECTRODE; SALT FILM; SUPERCONDUCTING RADIO FREQUENCY CAVITIES; VOLTAGE DROPS;

NIOBIUM;

EID: 49149130589     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2945913     Document Type: Article

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