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Volumn 44, Issue 3, 2008, Pages 302-
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Corrigendum to: "High-quality InAlN/GaN heterostructures grown by metal-organic vapor phase epitaxy" [Superlatt. Microstruct. 40 (2006) 214-218] (DOI:10.1016/j.spmi.2006.09.015)
a
NTT CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 49149100970
PISSN: 07496036
EISSN: 10963677
Source Type: Journal
DOI: 10.1016/j.spmi.2008.06.004 Document Type: Erratum |
Times cited : (2)
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References (0)
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