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Volumn 93, Issue 4, 2008, Pages
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Probing thickness-dependent dislocation storage in freestanding Cu films using residual electrical resistivity
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER ALLOYS;
COPPER PLATING;
CRYSTAL GROWTH;
ELECTRIC RESISTANCE;
ELECTROPLATING;
GRAIN (AGRICULTURAL PRODUCT);
GRAIN BOUNDARIES;
GRAIN SIZE AND SHAPE;
METALLIC FILMS;
MOLECULAR BEAM EPITAXY;
STRENGTHENING (METAL);
AVERAGE GRAIN SIZES;
CU FILMS;
DEFORMATION MECHANISMS;
DISLOCATION ANNIHILATION;
ELECTROPLATED CU FILMS;
FILM-THICKNESS;
FREE SURFACES;
GRAIN SIZES;
GRAIN-SIZE EFFECTS;
MICRO-STRUCTURAL;
RESIDUAL ELECTRICAL RESISTIVITY;
TENSILE LOADINGS;
THICKNESS EFFECTS;
COPPER;
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EID: 49149083834
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2961006 Document Type: Article |
Times cited : (12)
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References (17)
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