Multichannel silicon WDM ring filters fabricated with DUV lithography

Optics Communications

Volumn 281, Issue 17, 2008, Pages 4302-4306

  Lee, Jong Moo ^a   Park, Sahnggi ^a   Kim, Gyungock ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Integrated optics; Waveguides

Indexed keywords

CLADDING (COATING); HOLOGRAMS; LITHOGRAPHY; OPTICAL DESIGN; STANDARDS; TELECOMMUNICATION; WAVELENGTH DIVISION MULTIPLEXING;

(100) SILICON; CHANNEL CROSS TALK; DUV LITHOGRAPHY; ELSEVIER (CO); MULTI CHANNEL (MC); RING FILTERS; SPECTRAL PROPERTIES; STANDARD DEVIATION (STD); TRANSMISSION SPECTRUMS; ULTRAVIOLET (UV); WAVELENGTH DIVISION MULTIPLEXING (WDM);

WAVE FILTERS;

EID: 48949116101     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2008.04.047     Document Type: Article

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