Optimization of 90nm split gate nanocrystal non-volatile memory

2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop, Proceedings, NVSMW

Volumn , Issue , 2007, Pages 77-78

  Yater, Jane A ^a   Kang, S T ^a   Steimle, R ^a   Hong, C M ^a   Winstead, B ^a   Herrick, M ^a   Chindalore, G ^a  

^a FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 48649106796     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NVSMW.2007.4290588     Document Type: Conference Paper

References (5)

1. F. Ito et al., VLSI Symposium Tech. Dig., pp. 80-81, 2004.
2. M. Kamiya et al, IEDM Tech. Dig., pp. 741-4, 1982.
3. T. Osabe et al., VLSI Symposium Tech. Dig., pp. 242-3, 2004
4. J.Yater et al, IEEE NVSMW, pp. 60-61, 2006.
5. M. Sadd et al, Proc. of IEEE NVSWM, p. 82, 2001.