New focus assessment method for iris recognition systems

Pattern Recognition Letters

Volumn 29, Issue 13, 2008, Pages 1759-1767

  Jang, Jain ^a   Park, Kang Ryoung ^b   Kim, Jaihie ^a   Lee, Yillbyung ^a  

^a Yonsei University   (South Korea)

^b Dongguk University   (South Korea)

Author keywords

Focus assessment method; Iris recognition; SVM (support vector machine); Wavelet

Indexed keywords

BIOMETRICS; ELECTRIC RESISTANCE; ERROR ANALYSIS; FREQUENCY BANDS; IMAGE QUALITY; LEARNING SYSTEMS; WAVELET TRANSFORMS;

DEFOCUSING; ERROR RATE (ER); FOCUS ASSESSMENT; FOCUS MEASURES; HIGH-FREQUENCY (HF); IMAGE BRIGHTNESS; INPUT VALUES; IRIS IMAGES; IRIS PATTERNS; IRIS RECOGNITION; IRIS RECOGNITION SYSTEMS; LOW FREQUENCY (LF); OMNI DIRECTIONAL; OPTIMAL DECISION BOUNDARY; OPTIMUM THRESHOLDS; PIXEL SIZES; PROCESSING TIME; SPATIAL DOMAIN METHODS; SPECULAR REFLECTIONS; STATISTICAL LEARNING THEORY (SLT); SUB BAND (SB); WAVELET-BASED METHODS;

SUPPORT VECTOR MACHINES;

EID: 48649093382     PISSN: 01678655     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.patrec.2008.05.005     Document Type: Article

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