Magnetic field effects on electrochemical metal depositions

Science and Technology of Advanced Materials

Volumn 9, Issue 2, 2008, Pages

  Bund, Andreas ^a   Ispas, Adriana ^a   Mutschke, Gerd ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Electroplating; Experiment; Magnetoelectrolysis; Magnetohydrodynamics; Numerical simulation

Indexed keywords

CHLORINE COMPOUNDS; COMPUTATIONAL METHODS; COMPUTER SIMULATION; CRYSTAL GROWTH; ELECTROCHEMICAL CORROSION; ELECTROMAGNETIC FIELD EFFECTS; ELECTROMAGNETISM; EPITAXIAL GROWTH; FLUID DYNAMICS; FLUID MECHANICS; LORENTZ FORCE; MAGNETIC FIELD MEASUREMENT; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETISM; MASS TRANSFER; METALS; NICKEL; NUCLEATION; RATE CONSTANTS; THREE DIMENSIONAL;

3D GEOMETRY; ELECTRO-CHEMICAL REACTION; ELECTRO-CRYSTALLIZATION; ELECTROPLATING; EXPERIMENT; GOVERNING EQUATIONS; GRAVIMETRIC TECHNIQUE; IN-SITU; LORENTZ; MAGNETO-HYDRODYNAMIC; MAGNETOELECTROLYSIS; MAGNETOHYDRODYNAMICS; MASS TRANSPORT; METAL DEPOSITIONS; MHD EFFECTS; NUMERICA L RESULTS; NUMERICAL SIMULATION; NUMERICAL SIMULATIONS; PARTIAL CURRENTS;

MAGNETIC FIELD EFFECTS;

EID: 48449104231     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1088/1468-6996/9/2/024208     Document Type: Article

References (21)

1. Fahidy T Z 1983 J. Appl. Electrochem. 13 553
2. Tacken R A and Janssen L J J 1995 J. Appl. Electrochem. 25 1
3. Devos O, Aaboubi O, Chopart J-P, Merienne E, Olivier A and Amblard J 1998 J. Electrochem. Soc. 145 4135
4. Danilyuk A L, Kurmashev V I and Matyushkov A L 1990 Thin Solid Films 189 247
5. Brillas E, Rambla J and Casado J 1999 J. Appl. Electrochem. 29 1367
6. Matsushima H, Nohira T, Mogi I and Ito Y 2004 Surf. Coat. Technol. 179 245
7. Ispas A, Matsushima H, Plieth W and Bund A 2007 Electrochim. Acta 52 2785
8. Schneider O, Bund A, Ispas A, Borissenko N, Abedin S Z E and Endres F 2005 J. Phys. Chem. B 109 7159
9. Fahidy T Z 1973 Electrochim. Acta 18 607
10. Aogaki R, Fueki K and Mukaibo T 1975 Denki Kagaku oyobi Kogyo Butsuri Kagaku 43 504
11. Fahidy T Z 2001 Prog. Surf. Sci. 68 155
12. Lioubashevski O, Katz E and Willner I 2004 J. Phys. Chem. B 108 5778
13. Bund A and Kuehnlein H H 2005 J. Phys. Chem. B 109 19845
14. Weier T, Eckert K, Muhlenhoff S, Cierpka C, Bund A and Uhlemann M 2007 Electrochem. Commun. 9 2479
15. Fahidy T Z 1974 Chem. Eng. J. 7 21
16. Heerman L and Tarallo A 1999 J. Electroanal. Chem. 470 70
17. Scharifker B and Hills G 1983 Electrochim. Acta 28 879
18. Bund A and Schwitzgebel G 2000 Electrochim. Acta 45 3703
19. Boum G B N and Alemany A 1999 Electrochim. Acta 44 1749
20. Olivas P, Alemany A and Bark F H 2004 J. Appl. Electrochem. 34 19
21. Hyde M E and Compton R G 2003 J. Electroanal. Chem. 549 1