Multi-scale simulation of ultra-fast radiation anneal processes for robust process implementation

13th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2005

Volumn , Issue , 2005, Pages 149-150

  Knutson, K ^a   Hwang, J ^a   James, R ^a   Keys, P ^a   Talukdar, S ^a   Cea, S ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 48349130770     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2005.1613698     Document Type: Conference Paper

References (0)