Susceptibility of minor alloying to corrosion behavior in yttrium-containing bulk amorphous steel

Intermetallics

Volumn 16, Issue 8, 2008, Pages 1036-1039

  Wang, Z M ^a   Zhang, J ^a   Chang, X C ^a   Hou, W L ^a   Wang, J Q ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

B. Alloy design; B. Corrosion; B. Glasses, metallic; B. Microalloying; D. Defects: point defects

Indexed keywords

ALLOYING; ALLOYS; AMORPHOUS ALLOYS; CORROSION; CORROSION RESISTANCE; CORROSIVE EFFECTS; HEALTH; IRON; METALLIC COMPOUNDS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; PAINTING; PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM;

BULK AMORPHOUS; CORROSION BEHAVIORS; MINOR ALLOYING; MOTT SCHOTTKY ANALYSIS; PASSIVE FILMS; POTENTIODYNAMIC POLARIZATION MEASUREMENTS; SEMICONDUCTOR PROPERTIES; STRUCTURAL DEFECTS; X RAY PHOTOELECTRON SPECTROSCOPY (XPS);

YTTRIUM ALLOYS;

EID: 48349085379     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2008.05.005     Document Type: Article

References (29)

1. Naka M., Hashimoto K., and Masumoto T. J Jpn Inst Metals 38 (1974) 835
2. Tenhover M., Shreve G.A., Henderson R.S., and Lukco D.B. Appl Phys Lett 55 (1989) 1724
3. Hashimoto K. Corrosion 58 (2002) 715
4. Pang S.J., Zhang T., Asami K., and Inoue A. Corros Sci 44 (2002) 1847
5. Asami K., Habazaki H., Inoue A., and Hashimoto K. Mater Sci Forum 502 (2005) 225
6. Wang A.P., and Wang J.Q. J Mater Res 22 (2007) 1
7. Hashimoto K., Asami K., Kawashima A., Habazaki H., and Akiyama E. Corros Sci 49 (2007) 42
8. Katagiri H., Meguro S., Yamasaki M., Habazaki H., Sato T., Kawashima A., et al. Corros Sci 43 (2001) 171
9. Stimming U. Electrochim Acta 31 (1986) 415
10. Schmuki P., and Bohni H. J Electrochem Soc 139 (1992) 1908
11. Bojinov M., Fahricius G., Laitinen T., Makela K., Saario T., and Sundholm G. J Electrochem Soc 146 (1999) 3238
12. Wahlstrom E., Vestergaard E.K., Schaub R., Ronnau A., Vestergaard M., Laegsgaard E., et al. Science 303 (2004) 511
13. Kharton V.V., Marques F.M.B., and Atkinson A. Solid State Ion 174 (2004) 135
14. Nguyen T.L., Dokiya M., Wang S.R., Tagawa H., and Hashimoto T. Solid State Ion 130 (2000) 229
15. Kofstad P. Oxid Met 44 (1995) 3
16. Lu Z.P., Liu C.T., Thompson J.R., and Porter W.D. Phys Rev Lett 92 (2004) 245503
17. Ponnambalam V., Poon S.J., and Shiflet G.J. J Mater Res 19 (2004) 1320
18. Gu X.J., McDermott A.G., Poon S.J., and Shiflet G.J. Appl Phys Lett 88 (2006) 211905
19. Scully J.R., Gebert A., and Payer J.H. J Mater Res 22 (2007) 302
20. Wang W.H. Prog Mater Sci 52 (2007) 540
21. Moffat T.P., and Latanision R.M. J Electrochem Soc 139 (1992) 1869
22. Simmoes A.M.P., Ferreira M.G.S., Rondot B., and Belo M.D.C. J Electrochem Soc 137 (1990) 82
23. Jang H., and Kwon H. J Electroanal Chem 590 (2006) 120
24. Macdonald D.D. J Electrochem Soc 139 (1992) 3434
25. Maurice V., Yang W.P., and Marcus P. J Electrochem Soc 143 (1996) 1182
26. El-Aiat M.M., and Kroeger F.A. J Am Ceram Soc 65 (1982) 280
27. Pedraza F., Roman E., Cristobal M.J., Hierro M.P., and Perez F.J. Thin Solid Films 414 (2002) 231
28. Loudjani M.K., Huntz A.M., and Cortes R. J Mater Sci 28 (1993) 6466
29. Lapuerta S., Moncoffre N., Jaffrezic H., Millard-Pinard N., Bererd N., Esnouf C., et al. J Appl Phys 101 (2007) 064905