Resistance-pressure sensitivity and a mechanism study of multiwall carbon nanotube networks/poly(dimethylsiloxane) composites

Applied Physics Letters

Volumn 93, Issue 3, 2008, Pages

  Hu, C H ^b   Liu, C H ^a   Chen, L Z ^b   Peng, Y C ^b   Fan, S S ^b  

^a TSINGHUA UNIVERSITY   (China)

^b Tsinghua University ^*

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CARBON COMPOSITES; HEALTH; MECHANISMS; MULTIWALLED CARBON NANOTUBES (MWCN); NANOCOMPOSITES; NANOPORES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTECHNOLOGY; NANOTUBES;

AMERICAN INSTITUTE OF PHYSICS (AIP); APPLIED PRESSURE; DI METHYLSILOXANE (PDMS); ELECTRICAL RESISTANCES; I V CHARACTERISTICS; MECHANISM STUDY; MULTIWALL CARBON NANOTUBE (MWCNT); RESISTANCE PRESSURE SENSITIVITY; TRANSITION MECHANISMS; UNDER PRESSURE;

CARBON NANOTUBES;

EID: 48249137797     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2961028     Document Type: Article

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