Microstructure characterization of oxidation of aluminized coating prepared by a combined process

Journal of Nuclear Materials

Volumn 378, Issue 2, 2008, Pages 134-138

  Liu, H B ^a   Tao, J ^a   Xu, J ^a   Chen, Z F ^a   Sun, X J ^a   Xu, Z ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; BUILDING MATERIALS; CHEMICAL ELEMENTS; CHEMICAL OXYGEN DEMAND; CLADDING (COATING); FILM PREPARATION; FUSION REACTIONS; FUSION REACTORS; GAS COOLED REACTORS; INTERMETALLICS; IRON; LIGHT METALS; LITHOGRAPHY; METALS; MICROSTRUCTURE; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; MORPHOLOGY; NUCLEAR PHYSICS; NUCLEAR REACTORS; OXIDATION; OXIDE FILMS; PHASE STRUCTURE; PHOTOELECTRON SPECTROSCOPY; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLDERING ALLOYS; STAINLESS STEEL; TRANSMISSION ELECTRON MICROSCOPY; TRITIUM; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

(8 HYDROXY QUINOLINE) ALUMINUM; 316 L STAINLESS STEEL; ALUMINA LAYERS; ALUMINIZATION; ALUMINIZED COATINGS; CHEMICAL COMPOSITIONS; CHEMICAL STATES; COMBINED PROCESSING; ELECTRON MICROSCOPY (TEM AND SEM); HIGH TEMPERATURE GAS COOLED REACTORS (HTGR); INTERMETALLIC COMPOUND LAYER (IML); MICROSTRUCTURE CHARACTERIZATIONS; OXIDATION FILM; PLASMA TECHNOLOGIES; STRUCTURAL MATERIALS; TRITIUM LOSSES; X RAY DIFFRACTION (XRD); X RAY PHOTOELECTRON SPECTROSCOPY (XPS);

GAS PERMEABLE MEMBRANES;

EID: 48149105646     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2008.05.012     Document Type: Article

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