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Volumn , Issue , 2006, Pages 608-611

Power and failure analysis of CAM cells due to process variations

Author keywords

[No Author keywords available]

Indexed keywords

CMOS TECHNOLOGIES; EFFECTIVE CHANNEL LENGTH; ELECTRICAL PARAMETERS; INDIVIDUAL (PSS 544-7); INTERNATIONAL CONFERENCES; PARAMETER VALUES; PROCESS VARIATIONS; STRENGTH (IGC: D5/D6);

EID: 47349121594     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICECS.2006.379862     Document Type: Conference Paper
Times cited : (3)

References (5)
  • 3
    • 84886474055 scopus 로고    scopus 로고
    • Modeling and testing of sram for new failure mechanisms due to process variations in nanoscale cmos
    • May
    • Q. Chen, H. Mahmoodi, S. Bhunia, and K. Roy. Modeling and testing of sram for new failure mechanisms due to process variations in nanoscale cmos. In VLSI Test Symposium (VTS), May 2005.
    • (2005) VLSI Test Symposium (VTS)
    • Chen, Q.1    Mahmoodi, H.2    Bhunia, S.3    Roy, K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.