A scalable self-aligned contact NOR flash technology

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2007, Pages 226-227

  Wei, M ^a   Banerjee, R ^a   Zhang, L ^a   Masad, A ^a   Reidy, S ^a   Ahn, J ^a   Chao, H ^a   Lim, C ^a   Castro, T ^a   Karpenko, O ^a   Ru, M ^a   Fastow, R ^a   Brand, A ^a   Guo, X ^a   Gorman, J ^a   McMahon, W J ^a   Woo, B J ^a   Fazio, A ^a  

^a INTEL CORPORATION   (United States)

Author keywords

ETOX ; Flash; NOR; SAC

Indexed keywords

NANOTECHNOLOGY; TECHNOLOGY;

65-NM NODES; NOR FLASH; NOR FLASH MEMORY; SELF ALIGNED (SA); VLSI TECHNOLOGIES;

FLASH MEMORY;

EID: 47249155638     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2007.4339702     Document Type: Conference Paper

References (3)

1. R. Koval, et al, VLSI Symposium Technical Digest, pp. 204-205, 2005.
2. J.Kim, et al, IEDM Technical Digest, pp. 979-982, 1998.
3. A. Blosse, et al., to appear in VLSI-TSA Technical Digest, April 2007.