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Volumn 93, Issue 1, 2008, Pages
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Role of the buffer layer thickness on the formation of basal plane stacking faults in a -plane GaN epitaxy on r -sapphire
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Author keywords
[No Author keywords available]
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Indexed keywords
BUFFER LAYERS;
CORUNDUM;
CRYSTAL GROWTH;
CRYSTALLINE MATERIALS;
EPITAXIAL GROWTH;
EPITAXIAL LAYERS;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
OPTICAL PROPERTIES;
OPTICAL WAVEGUIDES;
SAPPHIRE;
SEMICONDUCTING CADMIUM TELLURIDE;
SEMICONDUCTING GALLIUM;
STACKING FAULTS;
A PLANE;
AMERICAN INSTITUTE OF PHYSICS (AIP);
BASAL PLANE STACKING FAULTS;
BUFFER LAYER THICKNESS;
CRYSTALLINE STRUCTURES;
EXTENDED DEFECTS;
GAN EPITAXY;
GAN FILMS;
LOW TEMPERATURE (LTR);
LOWER DENSITY;
OPTICAL (PET) (OPET);
R SAPPHIRE;
RANDOMLY DISTRIBUTED;
MOLECULAR BEAM EPITAXY;
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EID: 47249150091
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2953082 Document Type: Article |
Times cited : (26)
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References (13)
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