Mechanism of local amorphization of a heavily doped Ti1 - X v x CoSb intermetallic semiconductor

Semiconductors

Volumn 42, Issue 7, 2008, Pages 753-760

  Romaka, V A ^a,b   Stadnyk, Yu V ^c   Akselrud, L G ^c   Romaka, V V ^c   Fruchart, D ^d   Rogl, P ^e   Davydov, V N ^c   Gorelenko, Yu K ^c  

^a PIDSTRYHACH INSTITUTE FOR APPLIED PROBLEMS OF MECHANICS AND MATHEMATICS   (Ukraine)

^b LVIV POLYTECHNIC NATIONAL UNIVERSITY   (Ukraine)

^c IVAN FRANKO NATIONAL UNIVERSITY OF LVIV   (Ukraine)

^d LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^e UNIVERSITY OF VIENNA   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 47249115747     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063782608070014     Document Type: Article

References (14)

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