Novel, effective and cost-efficient method of introducing fluorine into metal/Hf-based gate stack in MuGFET and planar SOI devices with significant BTI improvement

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2007, Pages 112-113

  Shickova, A ^a,b   Collaert, N ^a   Zimmerman, P ^c   Demand, M ^a   Simoen, E ^a   Pourtois, G ^a   De Keersgieter, A ^a   Trojman, L ^a,b   Ferain, I ^a,b   Leys, F ^a   Boullart, W ^a   Franquet, A ^a   Kaczer, B ^a   Jurczak, M ^a   Maes, H ^a,b   Groeseneken, G ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE; LOGIC GATES;

COST-EFFICIENT; GATE STACKS; MULTI GATE DEVICES; SILICON ON INSULATOR (SOI) DEVICES; VLSI TECHNOLOGIES;

MOSFET DEVICES;

EID: 47249114376     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2007.4339748     Document Type: Conference Paper

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