In situ stress measurements during the electrochemical adsorption/desorption of self-assembled monolayers

Electrochimica Acta

Volumn 53, Issue 23, 2008, Pages 6778-6786

  Zangmeister, C D ^a   Bertocci, U ^b   Beauchamp, C R ^b   Stafford, G R ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

EQNB; Reductive desorption; Self assembled monolayers; Surface stress; Wafer curvature

Indexed keywords

DESORPTION;

4-MERCAPTOBENZOIC ACID (MBA); ADSORPTION DESORPTION; ELECTROCHEMICAL DESORPTION; IN SITU STRESS MEASUREMENTS; SELF ASSEMBLED MONOLAYERS (SAMS); SURFACE STRESSES;

SELF ASSEMBLED MONOLAYERS;

EID: 47249106927     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.12.013     Document Type: Article

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