Epoxy oligomers based on eugenol cyclotriphosphazene derivatives

Polymer Science - Series A

Volumn 50, Issue 6, 2008, Pages 609-615

  Kireev, V V ^a   Bredov, N S ^a   Bilichenko, Yu V ^a   Lysenko, K A ^b   Borisov, R S ^c   Chuev, V P ^d  

^a MENDELEEV UNIVERSITY OF CHEMICAL TECHNOLOGY OF RUSSIA   (Russian Federation)

^b A N NESMEYANOV INSTITUTE OF ORGANOELEMENT COMPOUNDS   (Russian Federation)

^c TOPCHIEV INSTITUTE OF PETROCHEMICAL SYNTHESIS   (Russian Federation)

^d ZAO VladMiVa   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

NUCLEAR MAGNETIC RESONANCE; PAINTING; PHOTORESISTS; POLYMERS; QUANTUM CHEMISTRY; SILICONES;

CYCLOTRIPHOSPHAZENE; CYCLOTRIPHOSPHAZENE DERIVATIVES; EPOXY GROUPS; EPOXY OLIGOMERS; INTER-MOLECULAR INTERACTIONS; M CHLOROPERBENZOIC ACID (MCPBA); NMR ANALYSES; PERACETIC ACID (PAA); PHOSPHAZENE; VALENCE ANGLES;

OLIGOMERS;

EID: 46749109704     PISSN: 0965545X     EISSN: 15556107     Source Type: Journal    
DOI: 10.1134/S0965545X08060035     Document Type: Article

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