Superior nanoscale passive oxide layers synthesized under photon irradiation for environmental protection

Applied Physics Letters

Volumn 92, Issue 26, 2008, Pages

  Chang, Chia Lin ^a   Engelhard, Mark H ^b   Ramanathan, Shriram ^a  

^a HARVARD UNIVERSITY   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHLORINE; CORROSION RESISTANCE; DEPTH PROFILING; ELECTRIC BREAKDOWN; ENVIRONMENTAL ENGINEERING; ENVIRONMENTAL PROTECTION; HEALTH; IRRADIATION; LIGHT METALS; METALS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; OXIDE FILMS; PAINTING; PHOTOELECTRON SPECTROSCOPY; PHOTONS; RADIATION; STRUCTURAL METALS; SUSTAINABLE DEVELOPMENT;

ALLOY STRUCTURES; ALUMI NUM OXIDE; AMERICAN INSTITUTE OF PHYSICS (AIP); FUNCTIONAL PROPERTIES; METAL SURFACES; NACL SOLUTIONS; NANO SCALING; NATIVE OXIDE LAYERS; NATIVE OXIDES; ORDER-OF MAGNITUDES; PASSIVE LAYERS; PASSIVE OXIDE LAYERS; PHOTON IRRADIATION; ROOM-TEMPERATURE (RT); SYNTHESIS (OF CHIRAL IONIC LIQUIDS); ULTRA-THIN OXIDE LAYERS; ULTRAVIOLET (UV); X RAY PHOTOELECTRON SPECTROSCOPY (XPS);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 46649119070     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2952282     Document Type: Article

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