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Volumn 155, Issue 8, 2008, Pages
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ICP-MS, SKPFM, XPS, and microcapillary investigation of the local corrosion mechanisms of WC-Co hardmetal
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Author keywords
[No Author keywords available]
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Indexed keywords
ADDITION REACTIONS;
CORROSION;
DISSOLUTION;
ELECTRODES;
GALVANIZING;
HIGH PERFORMANCE LIQUID CHROMATOGRAPHY;
INDUCTIVELY COUPLED PLASMA;
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY;
MASS SPECTROMETERS;
MASS SPECTROMETRY;
MECHANISMS;
MOLECULAR ORBITALS;
MOLECULAR SPECTROSCOPY;
PHOTOELECTRON SPECTROSCOPY;
PHOTORESISTS;
REACTION KINETICS;
SOLUTIONS;
SPECTRUM ANALYSIS;
TUNGSTEN ALLOYS;
X RAY PHOTOELECTRON SPECTROSCOPY;
(1 1 0) SURFACE;
AQUEOUS SOLUTIONS;
CARBON RICH SURFACE;
CHEMICAL DISSOLUTION;
CO DISSOLUTION;
COMPREHENSIVE MODELING;
CONCENTRATION MEASUREMENTS;
CORROSION SUSCEPTIBILITY;
ELECTRO CHEMICAL METHOD;
ELECTROCHEMICAL POTENTIAL (ECP);
ELECTROCHEMICAL SOCIETY (ECS);
ELEMENT ANALYSIS (EA);
GALVANIC COUPLING;
HARD METALS;
ICP-MS ,;
INDUCTIVELY COUPLED PLASMA- MASS SPECTROMETRY (ICP-MS);
LOCAL CORROSION;
LOCALIZED CORROSION;
MICRO CAPILLARIES;
MICRO SCALES;
ON-LINE FLOW;
OPEN-CIRCUIT POTENTIAL (OCP);
PH INCREASE;
REACTION MECHANISMS;
SCANNING KELVIN PROBE FORCE MICROSCOPY (SKPFM);
TIME-RESOLVED DETECTION;
X RAY PHOTOELECTRON SPECTROSCOPY (XPS);
SURFACE REACTIONS;
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EID: 46649116332
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.2929822 Document Type: Article |
Times cited : (60)
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References (44)
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