Use of electrodeposition for sample preparation and rejection rate prediction for assay of electroformed ultra high purity copper for 232Th and 238U prior to inductively coupled plasma mass spectrometry (ICP/MS)

Journal of Radioanalytical and Nuclear Chemistry

Volumn 277, Issue 1, 2008, Pages 103-110

  Hoppe, E W ^a   Aalseth, C E ^a   Brodzinski, R ^a   Day, A R ^a   Farmer, O T ^a   Hossbach, T W ^a   McIntyre, J I ^a   Miley, H S ^a   Mintzer, E E ^a   Seifert, A ^a   Smart, J E ^a   Warren, G A ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; THORIUM 232; URANIUM 238;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL REACTION; ELECTRODE; MASS SPECTROMETRY; RADIOASSAY; WAVEFORM;

EID: 46449134068     PISSN: 02365731     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10967-008-0716-5     Document Type: Article

References (4)

1. R. L. Brodzinski, H. S. Miley, J. H. Reeves, F. T. Avignone, J. Radioanal. Nucl. Chem., 193 (1995) 61.
2. C. E. Aalseth, R. L. Brodzinski, O. T. Farmer III, E. W. Hoppe, T. W. Hossbach, H. S. Miley, AIP Conf. Proc., 2005, p. 785.
3. S. E. Glover, H. Qu, S. P. Lamont, C. Grimm, R. H. Filby, J. Radioanal. Nucl. Chem., 248 (2001) 29.
4. R. L. Brodzinski, H. S. Miley, J. H. Reeves, F. T. Avignone, Nucl. Instr. Meth. Phys. Res., A292 (1990) 337.