Mechanism of copper underpotential deposition at Pt(hkl)-electrodes: Quantum-chemical modelling

Russian Journal of Electrochemistry

Volumn 44, Issue 6, 2008, Pages 697-708

  Danilov, A I ^a   Nazmutdinov, R R ^b   Zinkicheva, T T ^b   Molodkina, E B ^a   Rudnev, A V ^a   Polukarov, Yu M ^a   Feliu, J M ^c  

^a FRUMKIN INSTITUTE OF PHYSICAL CHEMISTRY AND ELECTROCHEMISTRY   (Russian Federation)

^b KAZAN NATIONAL RESEARCH TECHNOLOGICAL UNIVERSITY   (Russian Federation)

^c UNIVERSITY OF ALICANTE   (Spain)

Author keywords

Adatoms; Copper; Kinks; Monoatomic (100) and (111) steps; Pt(hkl); Quantum chemical modelling

Indexed keywords

ADSORPTION; BIOELECTRIC PHENOMENA; CONSERVATION; COPPER; COPPER ALLOYS; CRYSTALLOGRAPHY; CYCLIC VOLTAMMETRY; DESORPTION; ELECTRON ENERGY LEVELS; LANDFORMS; MECHANISMS; METALLIZING; MICROSCOPIC EXAMINATION; PLATINUM; SCANNING PROBE MICROSCOPY; SINGLE CRYSTALS; SOIL CONSERVATION; STAGES; SURFACE STRUCTURE; VOLTAMMETRY;

(O-SEC.-BUTYLDITHIOCARBONATIO-S ,S') COPPER; COPPER ADSORPTION; MONOLAYER FORMATION; ONE-DIMENSIONAL; PAIR INTERACTIONS; PLATINUM SINGLE CRYSTALS; SCANNING PROBES; STRUCTURE ELEMENTS; UNDER POTENTIAL DEPOSITION (UPD);

CHEMICAL ELEMENTS;

EID: 46449101364     PISSN: 10231935     EISSN: 16083342     Source Type: Journal    
DOI: 10.1134/S1023193508060104     Document Type: Article

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